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Plasma processing
Results: 359

#	Item
221	Nanoporous gold thin films deposited by magnetron sputtering: Tailoring the porosity R. Alvarez1, J. M. Garcia-Martin2, M. Macias-Montero1, L. Gonzalez-Garcia1, J.C. Gonzalez1, V. Rico1, J. Perlich3, J. Cotrino1,4, A. R. Add to Reading List Source URL: digital.csic.es Language: English - Date: 2014-10-29 04:10:31 Chemistry Thin film deposition Coatings Semiconductor device fabrication Plasma processing Sputter deposition Sputtering Grazing-incidence small-angle scattering Thin film Physics Materials science Science
222	New Journal of Physics The open–access journal for physics Toward scalable ion traps for quantum information processing J M Amini1,5 , H Uys2 , J H Wesenberg3 , S Seidelin4 , J Britton, Add to Reading List Source URL: tf.boulder.nist.gov Language: English - Date: 2010-04-22 19:31:58 Quadrupole ion trap Plasma Ion trap Mass analyzer Chemistry Measuring instruments
223	Growth regimes of microstructured gold thin films deposited by magnetron sputtering at oblique angles R. Alvarez1, J. M. Garcia-Martin2, M. Macias-Montero1, L. Gonzalez-Garcia1, J.C. Gonzalez1, P. Romero-Gomez1, J. Cotri Add to Reading List Source URL: digital.csic.es Language: English - Date: 2014-10-06 03:11:59 Thin film deposition Plasma processing Sputter deposition Sputtering Thin film Manufacturing Chemistry Materials science Coatings Semiconductor device fabrication
224	STEREO/HI RAL Technical Note[removed]Image Simulations for the Heliospheric Imager for the SECCHI/STEREO Project Add to Reading List Source URL: www.stereo.rl.ac.uk Language: English - Date: 2012-01-27 12:44:26 Light sources Astrophysics Physics Astronomy Image processing Pixel Detective quantum efficiency Sun Corona Plasma physics Space plasmas Digital imaging
225	CRY-3123 FINAL2.fh11[removed]:10 AM Page 1 C Composite M Add to Reading List Source URL: www.crystallumepvd.com Language: English - Date: 2008-11-05 20:00:05 Coatings Matter Plasma processing Manufacturing Nitrides Physical vapor deposition Titanium aluminium nitride Titanium nitride Chemical vapor deposition Chemistry Semiconductor device fabrication Thin film deposition
226	APPLIED PHYSICS LETTERS 95, 173102 共2009兲 Scalable arrays of rf Paul traps in degenerate Si J. Britton,1,a兲 D. Leibfried,2 J. A. Beall,1 R. B. Blakestad,2 J. H. Wesenberg,3 and D. J. Wineland2 1 Add to Reading List Source URL: tf.boulder.nist.gov Language: English - Date: 2009-11-30 14:03:12 Materials science Microtechnology Mass analyzer Plasma processing Measuring instruments Quadrupole ion trap Ion trap Microelectromechanical systems Standard hydrogen electrode Chemistry Semiconductor device fabrication Physics
227	Automated tracking Coronal Mass Ejections using CACTus V. Pant1, D.Banerjee1,2 , M.Mierla3,4 1. Indian Institute of Astrophysics, Bangalore, India 2. Center of excellence in space sciences, Kolkata, India 3. Royal Observ Add to Reading List Source URL: www.stce.be Language: English - Date: 2014-08-21 09:22:41 Space plasmas Coronal mass ejection Plasma physics Computer vision Image processing SWAP Hough transform Corona Space weather Astronomy Space Meteorology
228	U.S. Air Force Extends Waste-to-Energy Operating Contract MONTREAL, May 15, 2012 /CNW Telbec/ - PyroGenesis Canada Inc. ("PyroGenesis" or the "Company") (TSXV: PYR), an environmental solutions company that designs, devel Add to Reading List Source URL: www.pyrogenesis.com Language: English - Date: 2014-02-11 23:42:29 Waste management Thermal treatment Plasma physics Plasma processing Bioenergy Waste-to-energy Gasification Waste Management Inc Plasma Environment Sustainability Technology
229	PyroGenesis achieves significant milestone with U.S. Navy MONTREAL, Sept. 12, 2011 /CNW/ - PyroGenesis Canada Inc. ("PyroGenesis" or the "Company") (TSX-V: PYR), an environmental solutions company that designs, develops Add to Reading List Source URL: www.pyrogenesis.com Language: English - Date: 2014-02-11 23:41:47 Thermal treatment Waste management Plasma physics Plasma processing Bioenergy Waste-to-energy USS Gerald R. Ford Gasification Waste Management Inc Sustainability Technology Environment
230	Growth of WxSiyOz thin films by reactive magnetron sputtering from a single heterogeneous target R. Alvarez1, J. Gil-Rostra1, J. Cotrino1,2, A.R. Gonzalez-Elipe1, A. Palmero1 1 2 Add to Reading List Source URL: digital.csic.es Language: English - Date: 2014-08-22 06:01:14 Chemistry Coatings Manufacturing Physics Plasma processing Sputter deposition Sputtering Thin film Plasma Thin film deposition Materials science Semiconductor device fabrication

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